Thermal ALD-SiN
Model：DL6XX-ASE100
DL6XX-ASE100 series is a 12-inch Furnace device which forms SiN film by ALD (atomic deposition) in semiconductor manufacturing process. In the SiN deposition process, the device can precisely control the film formation thickness and uniformity, and has excellent step-coverage, compactness and low heat.
The equipment is designed to improve the cleaning process of residual particles, facilitate maintenance, and increase customer convenience. In addition, by improving the communication mode between equipment parts, the operation control system is simplified, and the product installation and life cycle are greatly improved.
Application: Integrated circuit manufacturing and advanced packaging
